Deadline for applications: 25th November 2018. The Industrial project will be focused on low-pressure RF plasma technology as well as on atomic layer deposition (ALD) and consists of an applied part and a scientific part. The former applied part is aimed at the further technical application development of a RF plasma source for the cleaning of optical precision surfaces and critical UHV chambers-especially for large size optical components-in the field of synchrotron and free electron laser (FEL) optics as next generation Extreme Ultraviolet (EUV) semiconductor lithography. The latter scientific part deals with R&D activities centered on the use of the same type of RF plasma source for the epitaxial thin film deposition of hybrid graphene/metal oxide multilayers, making use of the in-house competences on atomic layer deposition (ALD) as an additional tool for the deposition of metal oxide thin films onto graphene carbon nanostructures oriented towards supercapacitor materials.
The PhD student will be hired by ALBA where the main part of the work will be carried out.
- If you are interested in submitting your application please have a look at job offer 095/2018 - Optical surface cleaning & hybrid graphene/metal oxide thin film deposition using rPE-CVD and ALD
In order to submit an application for an industrial doctorate project, a digital copy of the completed form should be sent to doctorats.industrials.sur@gencat.cat, and the signed original to the Agency for Management of University and Research Grants (AGAUR): Passeig Lluís Companys, 23, 08010 Barcelona (RE: Industrial Doctorate Project).
Please, notice that the application must be submitted to the Catalan Government as indicated in the instructions and not to CELLS-ALBA.
For more information visit this web or contact industrialoffice@cells.es
